Description
Our USAF1951 test targets are produced using advanced photolithography processes to ensure precise line widths and spacing. The chrome-on-glass construction provides maximum durability and exceptional optical properties, including high contrast and edge definition necessary for accurate resolution measurements.
Model
|
Material
|
Coating Type
|
Over size
|
Positive/
Negative
|
Thickness
|
Pattern
|
LTU-025-(0-9,1)-PG
|
Quartz Glass
|
Blue Chrome
|
25x25mm/1″
|
Positive
|
1.6mm
|
Group 0 Element1 to Group 9 Element1
|
LTU-025-(0-9,1)-NG
|
Quartz Glass
|
Blue Chrome
|
25x25mm/1″
|
Negative
|
1.6mm
|
Group 0 Element1 to Group 9 Element1
|
LTU-025-(0-9,6)-PG
|
Quartz Glass
|
Blue Chrome
|
25x25mm/1″
|
Positive
|
1.6mm
|
Group 0 Element1 to Group 9 Element1
|
LTU-025-(0-9,6)-PG
|
Quartz Glass
|
Blue Chrome
|
25x25mm/1″
|
Negative
|
1.6mm
|
Group 0 Element1 to Group 9 Element1
|
LTU-050-(0-9,1)-PG
|
Quartz Glass
|
Blue Chrome
|
50x50mm/2″
|
Positive
|
1.6mm
|
Group 0 Element1 to Group 9 Element1
|
LTU-050-(0-9,1)-PG
|
Quartz Glass
|
Blue Chrome
|
50x50mm/2″
|
Negative
|
1.6mm
|
Group 0 Element1 to Group 9 Element1
|
LTU-050-(0-9,6)-PG
|
Quartz Glass
|
Blue Chrome
|
50x50mm/2″
|
Positive
|
1.6mm
|
Group 0 Element1 to Group 9 Element1
|
LTU-050-(0-9,6)-PG
|
Quartz Glass
|
Blue Chrome
|
50x50mm/2″
|
Negative
|
1.6mm
|
Group 0 Element1 to Group 9 Element1
|
LTU-076-(-2-9,1)-PG
|
Quartz Glass
|
Blue Chrome
|
76x76mm/3″
|
Positive
|
1.6mm
|
Group -2 Element1 to Group 9 Element1
|
LTU-076-(-2-9,1)-PG
|
Quartz Glass
|
Blue Chrome
|
76x76mm/3″
|
Negative
|
1.6mm
|
Group -2 Element1 to Group 9 Element1
|
LTU-076-(-2-9,6)-PG
|
Quartz Glass
|
Blue Chrome
|
76x76mm/3″
|
Positive
|
1.6mm
|
Group -2 Element1 to Group 9 Element1
|
LTU-076-(-2-9,6)-PG
|
Quartz Glass
|
Blue Chrome
|
76x76mm/3″
|
Negative
|
1.6mm
|
Group -2 Element1 to Group 9 Element1
|
Technical Specifications
The USAF1951 pattern consists of groups of three horizontal and three vertical bars, with each group containing six elements. Each successive element is approximately 12% smaller than the previous (factor of 2^(1/6)), and each successive group is half the size of the previous group. This standardized progression allows for precise resolution measurements across a wide range of optical systems.
Product Specification | ||||||||
Pattern Info | Substrate Material Info | |||||||
Production Process | Laser Writing | Substrate Material of Glass |
Quartz Glass (Fused Silica) | |||||
Minimum Line/space | 1μm / 0.55μm | Transmission (@550nm) |
>95% | |||||
Feature Accuracy & Avarage Accuracy |
±1μm | Thermal Expansion Coeff (20-200 ℃) |
<5.0×10⁻⁷/K | |||||
Coating Type | Blue Chrome (Low Reflective) | Expansion Ratio (20-200 ℃) |
0.00006%(0.6μm/℃ of 1m) | |||||
Reflectivity | < 13.4% @550nm | Surface Flatness | <0.55μm (Dimension<50mm) | |||||
< 1.8% @650nm | <2μm (Dimension<100mm) | |||||||
< 2.67% @750nm | <5μm (Dimension>100mm) | |||||||
Coating Thickness | 120nm (±0.20nm) | Surface Roughness | <0.025μm | |||||
Optical Density OD | >4.5 | Thickness | 1.6mm (±0.3mm) | |||||
White Background | Minimum Line/space: 10μm, Thickness: 40μm (White & Smooth Coating on the Back Side) |
MIN / MAX Overall Size |
Min: 4x4mm;
Max: 800x960mm |
|||||
Positive / Negative |
|
Target Shape | Square |
Configuration Options
- Standard Version: Groups -2 to 7 (0.250 to 228 line pairs/mm)
- High-Resolution Version: Groups 2 to 9 (4.0 to 912 line pairs/mm)
- Low-Resolution Version: Groups -4 to 2 (0.0625 to 7.13 line pairs/mm)
- Pattern Orientation: Positive (black lines on clear background) or Negative (clear lines on black background)
- Custom Configurations: Available upon request for specialized applications
Number of line pairs per millimeter in USAF Resolving Power Test Target 1951 | ||||||||||||
Group Number | ||||||||||||
Element | -2 | -1 | 0 | 1 | 2 | 3 | 4 | 5 | 6 | 7 | 8 | 9 |
1 | 0.250 | 0.500 | 1.00 | 2.00 | 4.00 | 8.00 | 16.00 | 32.0 | 64.0 | 128.0 | 256.0 | 512.0 |
2 | 0.281 | 0.561 | 1.12 | 2.24 | 4.49 | 8.98 | 17.96 | 35.9 | 71.8 | 143.7 | 287.4 | 574.7 |
3 | 0.315 | 0.630 | 1.26 | 2.52 | 5.04 | 10.08 | 20.16 | 40.3 | 80.6 | 161.3 | 322.5 | 645.1 |
4 | 0.354 | 0.707 | 1.41 | 2.83 | 5.66 | 11.31 | 22.63 | 45.3 | 90.5 | 181.0 | 362.0 | 724.1 |
5 | 0.397 | 0.794 | 1.59 | 3.17 | 6.35 | 12.70 | 25.40 | 50.8 | 101.6 | 203.2 | 406.4 | 812.7 |
6 | 0.445 | 0.891 | 1.78 | 3.56 | 7.13 | 14.25 | 28.51 | 57.0 | 114.0 | 228.1 | 456.1 | 912.3 |
Width of a line in micrometers in USAF Resolving Power Test Target 1951 | ||||||||||||
Group Number | ||||||||||||
Element | -2 | -1 | 0 | 1 | 2 | 3 | 4 | 5 | 6 | 7 | 8 | 9 |
1 | 2000.00 | 1000.00 | 500.00 | 250.00 | 125.00 | 62.50 | 31.25 | 15.63 | 7.81 | 3.91 | 1.95 | 0.98 |
2 | 1781.80 | 890.90 | 445.45 | 222.72 | 111.36 | 55.68 | 27.84 | 13.92 | 6.96 | 3.48 | 1.74 | 0.87 |
3 | 1587.40 | 793.70 | 396.85 | 198.43 | 99.21 | 49.61 | 24.80 | 12.40 | 6.20 | 3.10 | 1.55 | 0.78 |
4 | 1414.21 | 707.11 | 353.55 | 176.78 | 88.39 | 44.19 | 22.10 | 11.05 | 5.52 | 2.76 | 1.38 | 0.69 |
5 | 1259.92 | 629.96 | 314.98 | 157.49 | 78.75 | 39.37 | 19.69 | 9.84 | 4.92 | 2.46 | 1.23 | 0.62 |
6 | 1122.46 | 561.23 | 280.62 | 140.31 | 70.15 | 35.08 | 17.54 | 8.77 | 4.38 | 2.19 | 1.10 | 0.55 |
Quality Assurance
Each test target undergoes rigorous inspection to verify pattern accuracy, optical density, and substrate quality. Our manufacturing process maintains tight tolerances, ensuring consistent performance across production batches. Each target is delivered with a calibration certificate confirming pattern accuracy and traceability.
Package Contents
- USAF1951 Test Target (specified configuration)
- Protective storage case
- Calibration certificate
- Handling instructions
Applications
Machine Vision & Industrial Inspection
- Camera resolution verification and calibration
- Lens performance evaluation
- System resolution documentation for quality control
- Validation of minimum detectable feature size
Scientific & Laboratory
- Microscope resolution testing and calibration
- Optical system characterization
- Resolution comparison between different optical configurations
- Documentation of imaging capability for publications
Electronics Manufacturing
- PCB inspection system calibration
- Component placement verification setup
- Solder joint inspection system configuration
Medical Imaging
- Endoscope and medical camera testing
- Surgical microscope calibration
- Quality assurance for diagnostic imaging systems
Educational & Research
- Optical laboratory experiments
- Demonstration of resolution concepts
- Standardized testing for research protocols
Photography & Imaging
- Lens testing and comparison
- Camera sensor evaluation
- Resolution documentation across aperture settings
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